Lithographic apparatus and device manufacturing method utilizing a microlens array at an image plane
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United States of America Patent
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Feb 20, 2007
Grant Date -
Jun 22, 2006
app pub date -
Dec 17, 2004
filing date -
Dec 17, 2004
priority date (Note) -
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Abstract
A lithographic apparatus includes a radiation system, a patterning device, and a projection system. The patterning device patterns a beam of radiation from the radiation system. The projection system projects the patterned beam onto a target portion of a substrate. The projection system comprising a pupil positioned at a pupil plane of the projection system and an array of lenses positioned at an image plane of the projection system. The patterning device is conjugate to the array of lenses and the pupil is conjugate to the substrate.
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