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United States of America Patent

PATENT NO 8636876
SERIAL NO

11297057

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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In accordance with the present invention, deposition of LiCoO2 layers in a pulsed-dc physical vapor deposition process is presented. Such a deposition can provide a low-temperature, high deposition rate deposition of a crystalline layer of LiCoO2 with a desired <101> or <003> orientation. Some embodiments of the deposition address the need for high rate deposition of LiCoO2 films, which can be utilized as the cathode layer in a solid state rechargeable Li battery. Embodiments of the process according to the present invention can eliminate the high temperature (>700° C.) anneal step that is conventionally needed to crystallize the LiCoO2 layer.

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Patent Owner(s)

  • DEMARAY, LLC

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Demaray, Richard E Portola Valley, US 36 1792
Zhang, Hongmei San Jose, US 40 650

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