Lithographic apparatus and device manufacturing method

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United States of America Patent

PATENT NO 7274029
APP PUB NO 20060138358A1
SERIAL NO

11022923

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Abstract

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A projection system comprises an array of lenses MLA, each lens transmitting a unique part of a patterned beam. Measuring devices measure a distance between the array of lenses MLA and a substrate W. A controller controls an actuator to adjust a position (e.g., height and/or tilt) of the microlens array MLA.

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Patent Owner(s)

  • ASML NETHERLANDS B.V.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
De, Smit Joannes Theodoor Eindhoven, NL 50 5861
Lof, Joeri Eindhoven, NL 94 8069

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