Method for measuring information about a substrate, and a substrate for use in a lithographic apparatus
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United States of America Patent
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Apr 8, 2008
Grant Date -
Jun 29, 2006
app pub date -
May 24, 2005
filing date -
Dec 29, 2004
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A method for measuring information provided by a substrate. The substrate includes a feature that has been created by a lithographic apparatus. The method includes projecting a beam of light onto a marker disposed above and/or near the feature on the substrate, and detecting information provided by the marker with a sensor. A coating is disposed on the substrate so that the coating lies between the beam of light and the feature to substantially prevent the beam of light from being reflected by the feature and causing an inaccurate readout of the information provided by the marker.
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