Methods and systems for lithographic beam generation
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Mar 11, 2008
Grant Date -
Jun 29, 2006
app pub date -
Dec 29, 2004
filing date -
Dec 29, 2004
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A lithographic illumination apparatus and method includes receiving a plurality of source radiation beams from a plurality of corresponding radiation sources, deflecting the plurality of source radiation beams along a common beam path, thereby generating a projection beam of radiation, imparting the projection beam of radiation with a cross-section pattern, and projecting the patterned projection beam of radiation onto a target portion of a substrate.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully