Systems and methods for minimizing scattered light in multi-SLM maskless lithography
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United States of America Patent
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Jul 28, 2009
Grant Date -
Jul 6, 2006
app pub date -
Jan 6, 2005
filing date -
Jan 6, 2005
priority date (Note) -
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Abstract
The present invention is directed to a lithography system in which scattered light from a pattern generator, having one or more pattern generating devices, is blocked from an object, such as a wafer or display. The system includes a pattern generator with multiple pattern generating devices, a projection system for directing light from the pattern generating device, and an aperture located at or near an object window. The aperture has a profile that matches the configuration of the pattern generating devices. A method for blocking scattered light in a lithography system using multiple pattern generating devices is also provided.
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