Appartus and method for forming pattern
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United States of America Patent
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Issued Date -
N/A
app pub date -
Mar 1, 2006
filing date -
Dec 27, 2001
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
A pattern forming apparatus includes a drawing chamber having a drawing substrate on which an original pattern is drawn, a first temperature control unit having a first temperature regulator to make the temperature of the drawing chamber constant, and a constant-temperature member arranged near the drawing substrate. The pattern forming apparatus further includes a second temperature control unit having a second temperature regulator. The second temperature control unit is configured to control the set temperature of the constant-temperature member independently such that the temperature of the drawing substrate becomes substantially constant when the original pattern is drawn.
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Cited Art Landscape
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