Semiconductor device, method for making pattern layout, method for making mask pattern, method for making layout, method for manufacturing photo mask, photo mask, and method for manufacturing semiconductor device
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United States of America Patent
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May 11, 2010
Grant Date -
Jul 20, 2006
app pub date -
Dec 13, 2005
filing date -
Dec 13, 2004
priority date (Note) -
Expired
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Abstract
and in terms of a pattern including the connection area among the at least of Ni circuit patterns, the larger the i, the connection area being arranged at a further position in longitudinal direction.
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