PLASMA PROCESSING SYSTEM AND PLASMA TREATMENT PROCESS
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United States of America Patent
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app pub date -
Apr 3, 2006
filing date -
Oct 28, 2003
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Abstract
A plasma treatment system for treating multiple substrates with a plasma. The treatment chamber of the plasma treatment system includes at least one pair of electrodes, typically vertically oriented, between which a substrate is positioned for plasma treatment. Each electrode includes a perforated panel that permits horizontal process gas and plasma flow, which improves plasma uniformity. A process recipe is defined that is effective for removing thin polymer areas, such as flash or chad, attached to and projecting from a polymer substrate.
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