Imprint lithography method to control extrusion of a liquid from a desired region on a substrate
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United States of America Patent
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Issued Date -
Aug 10, 2006
app pub date -
Feb 4, 2005
filing date -
Feb 4, 2005
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
The present invention is directed to a method of controlling a quantity of liquid from extruding from a volumetric gap defined between a mold included in the substrate and a region of the substrate in superimposition therewith that features varying the capillary forces between the liquid and one of the template and the substrate. To that end, the method includes generating capillary forces between the liquid and one of the template and the substrate; and varying a magnitude of the forces to create a gradient of forces.
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