Method of fabricating a polarizing layer on an interface

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United States of America Patent

PATENT NO 7186992
APP PUB NO 20060177594A1
SERIAL NO

11053381

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A method of fabricating a polarizing layer using a gas cluster ion beam apparatus (GCIB) is disclosed. The method includes generating a metal-organic gas that includes a metal-organic compound. The metal-organic compound includes a polarizing material, such as iron Fe, Co, or CoFe, for example. The metal-organic gas and a carrier gas are combined to form a composite gas that is supplied to the GCIB. The GCIB processes the composite gas to form a beam of gas cluster ions that include the polarizing material. The beam irradiates an interface surface of a layer of material and at least a portion of the polarizing material remains in contact with the interface surface to form the polarizing layer on the interface surface.

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Patent Owner(s)

  • SAMSUNG ELECTRONICS CO., LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Nickel, Janice H Sunnyvale, CA 69 1101

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