Silicon dioxide film and process for preparation of the same
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United States of America Patent
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Issued Date -
Aug 31, 2006
app pub date -
Mar 25, 2004
filing date -
Mar 25, 2003
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A transparent amorphous silicon dioxide film containing many fine voids, characterized in that the refractive index (for light at .lamda.=500 nm) is in the range of 1.01 to 1.40 and that 80 vol. % or more of the fine voids have a diameter of 5 nm or less, has a low refractive index and excellent physical strength such as high scratch resistance, so that it is advantageously employable as an optical film of an optical device for various uses.
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