Exposure apparatus and device manufacturing method
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United States of America Patent
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Apr 12, 2011
Grant Date -
Oct 19, 2006
app pub date -
Mar 15, 2006
filing date -
Sep 19, 2003
priority date (Note) -
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status (Latency Note)
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Abstract
An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate via a projection optical system and a liquid. The exposure apparatus includes a liquid supply device which supplies liquid onto the substrate from above the substrate through a first and second supply ports disposed in a vicinity of a projection area onto which the pattern image is projected, and a liquid recovery device which recovers liquid on the substrate from above the substrate through an inside recovery port disposed outside the first and second supply ports and an outside the second recovery port disposed outside the inside recovery port.
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