Projection exposure apparatus, cleaning and maintenance methods of a projection exposure apparatus, and device manufacturing method
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Oct 11, 2011
Grant Date -
Oct 19, 2006
app pub date -
Mar 23, 2006
filing date -
Sep 26, 2003
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A projection exposure apparatus that exposes a substrate with a liquid interposed between a surface of the substrate and an optical element on the substrate side of a projection optical system; includes liquid supply and discharge mechanisms, which supply the liquid via a liquid supply tube as they recover the liquid via a liquid recovery tube, and an adhesion preventing mechanism that prevents an adhesion of impurities on member forming a flow path for the liquid.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully