Computer-implemented methods for detecting defects in reticle design data
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United States of America Patent
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Jan 12, 2010
Grant Date -
Oct 19, 2006
app pub date -
Jan 31, 2005
filing date -
Jan 29, 2004
priority date (Note) -
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status (Latency Note)
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Abstract
Computer-implemented methods for detecting defects in reticle design data are provided. One method includes generating a first simulated image illustrating how the reticle design data will be printed on a reticle using a reticle manufacturing process. The method also includes generating second simulated images using the first simulated image. The second simulated images illustrate how the reticle will be printed on a wafer at different values of one or more parameters of a wafer printing process. The method further includes detecting defects in the reticle design data using the second simulated images. Another method includes the generating steps described above in addition to determining a rate of change in a characteristic of the second simulated images as a function of the different values. This method also includes detecting defects in the reticle design data based on the rate of change.
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