Method of cleaning a substrate surface from a crystal nucleus
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United States of America Patent
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Issued Date -
Oct 26, 2006
app pub date -
Apr 10, 2006
filing date -
Apr 8, 2005
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A method of cleaning a substrate surface from a crystal nucleus in which the substrate surface is held in a condition under which a crystal growth is accelerated with respect to normal clean room and normal air conditions. In particular, light having a wavelength to induce a crystal growth is irradiated and, additionally, at least one reactive gas is fed at a higher concentration than under normal clean room and normal air conditions. After placing the substrate under these conditions, the grown crystals are removed, for example, by rinsing with water. As a consequence, the crystal nucleus is removed from the substrate surface.
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