Method for analyzing defect data and inspection apparatus and review system

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United States of America Patent

SERIAL NO

11472399

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Abstract

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The distribution states of defects are analyzed on the basis of the coordinates of defects detected by an inspection apparatus to classify them into a distribution feature category, or any one of repetitive defect, congestion defect, linear distribution defect, ring/lump distribution defect and random defect. In the manufacturing process for semiconductor substrates, defect distribution states are analyzed on the basis of defect data detected by an inspection apparatus, thereby specifying the cause of defect in apparatus or process.

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Patent Owner(s)

Patent OwnerAddress
SHIBUYA HISAENot Provided

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Shibuya, Hisae Yokohama, JP 56 1491
Takagi, Yuji Kamakura, JP 234 4214

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