Single-crystalline gallium nitride substrate

United States of America Patent

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Issued Date
Nov 16, 2006
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May 12, 2006
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May 12, 2005

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Abstract

The present invention relates to a single-crystalline gallium nitride substrate having an n-doping concentration of about 0.7.times.10.sup.18 to about 3.times.10.sup.18/cm.sup.3 and a thermal conductivity of at least about 1.5 W/cmK at a room temperature (300 K), and being appropriately applied in manufacturing of a light emitting device.

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Patent Owner	Address
SAMSUNG CORNING PRECISION GLASS CO LTD	SOUTH KOREA GYEONGBUK GUMI GUMI CHUNGCHEONGBUK-DO

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H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....

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Inventor Name	Address	# of filed Patents	Total Citations
Kim, Chong Don	Seongnam-si, KR	1	1
Lee, Changho	Suwon-si, KR	101	552
Lee, Hae Yong	Gwangmyeong-si, KR	14	51
Shin, Hyun Min	Seoul, KR	12	28

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Single-crystalline gallium nitride substrate

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United States of America Patent

11432502

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11432502

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