Lithographic apparatus and device manufacturing method
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United States of America Patent
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Jan 29, 2008
Grant Date -
Nov 16, 2006
app pub date -
Jul 14, 2006
filing date -
Feb 27, 2004
priority date (Note) -
In Force
status (Latency Note)
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Abstract
An arrangement for adjusting the position on a substrate of a patterned beam generated by a light engine relative to the substrate. The arrangement moves an array of focusing elements, each of which focuses a portion of the patterned beam onto a point on the substrate, relative to an array of individually controllable elements to impart the pattern to the patterned beam.
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