Lithographic apparatus and device manufacturing method utilizing 2D run length encoding for image data compression

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United States of America Patent

PATENT NO 7477772
APP PUB NO 20060269116A1
SERIAL NO

11140559

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Abstract

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A lithographic apparatus comprises an array of individually controllable elements and a data processing pipeline. The array of individually controllable elements modulates a beam of radiation. The data processing pipeline converts a first representation of a requested dose pattern to a sequence of control data suitable for controlling the array of individually controllable elements in order substantially to form the requested dose pattern on a substrate. The data processing pipeline comprises an offline pre-processing device and an online rasterizer. The offline pre-processing device converts the first representation of the requested dose pattern to an intermediate representation, which can be rasterized in a fewer number of operations than the first representation. The storage device stores the intermediate representation. The online rasterizer accesses the stored intermediate representation and produces therefrom a stream of bitmap data to be used to generate the sequence of control data substantially in real time.

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Patent Owner(s)

  • ASML NETHERLANDS B.V.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bontekoe, Marcel Veldhoven , NL 4 52
Kessels, Lambertus Gerardus Maria Aalst-waaire , NL 12 109
Makarovic, Andrej Veldhoven , NL 2 23
Venema, Willem Jurrianus Eindhoven , NL 23 220

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