System and method for characterizing aerial image quality in a lithography system
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United States of America Patent
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Jul 21, 2009
Grant Date -
Dec 7, 2006
app pub date -
May 19, 2006
filing date -
Jun 3, 2005
priority date (Note) -
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Abstract
While a high-resolution 2-dimensional image reconstruction is expected to give the maximum possible amount of information on the aerial image in a projection system, relevant information regarding image quality can be derived from a statistical evaluation of image values. Relevant statistical image data can be derived by sampling at a multitude of non-adjacent locations across a large area, rather than by scanning over many adjacent locations on a small area. Examples of the benefits of the present invention include: (1) it generally does not rely on very precise, repeatable fine alignment of the image sensor array with respect to the mask and/or the projected image; (2) a large number of individual sensor elements are utilized, and image data is generated from a large set of signal values; and (3) it can generate relevant data to assess aerial image quality in a very short data acquisition time.
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