Lithographic apparatus and device manufacturing method utilizing substrate stage compensating
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United States of America Patent
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Nov 6, 2007
Grant Date -
Dec 14, 2006
app pub date -
Jun 8, 2005
filing date -
Jun 8, 2005
priority date (Note) -
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status (Latency Note)
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Abstract
A lithographic apparatus has an illumination system that conditions a radiation beam and a patterning device support that supports a patterning device. The patterning device patterns the radiation beam. The lithographic apparatus also has a substrate support that supports a substrate, a machine frame that supports the substrate support, a projection system that projects the patterned beam onto a target portion of the substrate, and a substrate support drive that moves the substrate support in at least one direction. The lithographic apparatus can have a reaction mass, a balance mass, a base frame, where the substrate support drive is configured to generate a force in the at least one direction between the substrate support and the reaction mass, the balance mass, or the support frame.
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