Lithographic apparatus and device manufacturing method for writing a digital image

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United States of America Patent

PATENT NO 7742148
APP PUB NO 20060281032A1
SERIAL NO

11147466

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Abstract

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First pluralities of radiation spots generated by an array of individually controllable elements are exposed on a substrate. The radiation spots are equally spaced across an entire area of the substrate to be exposed. The substrate is then shifted relative to the array of individually controllable elements in a direction perpendicular to a scanning direction of the substrate. Second pluralities of radiation spots generated by the array of individually controllable elements are alternatingly formed on the substrate with respect to each of the first plurality of spots.

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Patent Owner(s)

  • ASML NETHERLANDS B.V.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Van, Groos Pieter Johannes Marius Geldrop, NL 6 21

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