Computer-implemented methods for detecting and/or sorting defects in a design pattern of a reticle
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United States of America Patent
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Jun 1, 2010
Grant Date -
Dec 28, 2006
app pub date -
Dec 7, 2004
filing date -
Dec 7, 2004
priority date (Note) -
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Abstract
Various computer-implemented methods are provided. One method for sorting defects in a design pattern of a reticle includes searching for defects of interest in inspection data using priority information associated with individual defects in combination with one or more characteristics of a region proximate the individual defects. The priority information corresponds to modulation levels associated with the individual defects. The inspection data is generated by comparing images of the reticle generated for different values of a lithographic variable. The images include at least one reference image and at least one modulated image. A composite reference image can be generated from two or more reference images. The method also includes assigning one or more identifiers to the defects of interest. The identifier(s) may include, for example, a defect classification and/or an indicator identifying if the defects of interest are to be used for further processing.
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