Chamber isolation valve RF grounding
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United States of America Patent
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-
Dec 30, 2008
Grant Date -
Jan 4, 2007
app pub date -
Jul 1, 2005
filing date -
Jul 1, 2005
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A method and apparatus for grounding a chamber isolation valve are provided. Generally, the method makes use of an electrically conductive elastomeric member or members to effectively ground a chamber isolation valve and/or isolation valve door while avoiding metal-to-metal contact between moving parts in the processing system. In one embodiment, the elastomeric member is attached to and in electrical communication with the door of the chamber isolation valve. The elastomeric member is brought into contact with a grounded component of the plasma processing system when the door is in the closed position. In another embodiment, the conductive elastomeric member is attached to a bracing member of the isolation valve and is brought into contact with a grounded component of the plasma processing system when the bracing member is deployed to hold the isolation valve door in place during substrate processing. Other configurations are also provided.
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