Lithographic apparatus and device manufacturing method utilizing movement of clean air to reduce contamination
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United States of America Patent
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Apr 21, 2009
Grant Date -
Jan 4, 2007
app pub date -
Jun 29, 2005
filing date -
Jun 29, 2005
priority date (Note) -
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Abstract
A lithographic apparatus comprises a substrate table that supports a substrate and a substrate handler that moves the substrate relative to the substrate table. The substrate handler is adapted to load substrates on to and unload substrates from the substrate table before and after exposure. Also, a clean gas supply system supplies a clean gas to at least one location at which the substrate is located. The clean gas supply system is moveably mounted. A device manufacturing method utilizing the lithographic apparatus can be used to manufacture at least one of a flat panel display and an integrated circuit device.
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