Image inspection method
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United States of America Patent
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N/A
Issued Date -
Jan 4, 2007
app pub date -
Jun 30, 2005
filing date -
Jun 30, 2005
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
Embodiments of the invention provide methods and apparatuses for detecting defects and contaminants on reticles. For one embodiment of the invention, either one or both of an aerial image database and a resist image database are created and compared to an actual scanned mask die image. For one embodiment of the invention, the comparison is used to identify defects of contaminants on the reticle. For one embodiment of the invention, a decision as to whether the reticle should be discarded or cleaned and repaired is made based upon the determined defects or contaminants.
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