Lithographic apparatus and device manufacturing method utilizing a datapath having a balanced calculation load
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United States of America Patent
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Jun 21, 2011
Grant Date -
Jan 11, 2007
app pub date -
Jun 28, 2005
filing date -
Jun 28, 2005
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Abstract
A lithography apparatus with a data-path for converting a representation of a requested dose pattern to a sequence of control data suitable for controlling an array of individually controllable elements. The data path comprises a plurality of data manipulation devices and a calculation load controller for balancing a calculation load between the data manipulation devices. A device manufacturing method using elements of the lithography apparatus, and a flat panel display and integrated circuit device manufactured using the method.
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