Systems and methods for achieving a required spot says for nanoscale surface analysis using soft x-rays

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United States of America Patent

SERIAL NO

11453338

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Abstract

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A nano-scale surface analysis system is configured to reduce a laser-produced plasma spot size, while maintaining flux levels at target. The system comprises a condenser zone plate operable to receive short wavelength radiation and focus the short wavelength radiation into a spot on the target. The target is positioned such it is located at an order of diffraction of the condenser zone plate that is greater than the first diffractive order of the condenser zone plate and sufficient to demagnify the spot to a diameter less than one micron. In addition, the target is still positioned such that a flux created at the target by the spot is sufficient to produce a nanoplasma.

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Patent Owner(s)

Patent OwnerAddress
JMAR LLC A DELAWARE LIMITED LIABILITY COMPANY10905 TECHNOLOGY PLACE SAN DIEGO CA 92127

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bloom, Scott H Encinitas, CA 20 599

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