Gas manifold valve cluster
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United States of America Patent
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N/A
Issued Date -
Feb 8, 2007
app pub date -
Jul 31, 2006
filing date -
Jul 29, 2005
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
The present invention relates generally to a deposition apparatus for semiconductor processing. More specifically, embodiments of the present invention relate to a gas manifold valve cluster and deposition apparatus. In some embodiments of the present invention a gas manifold valve cluster and system are provided that promotes reduced length and volumes of gas lines that will be exposed to atmosphere during cleaning which minimizes the time required to perform process chamber maintenance and therefore increase the productivity of the process chamber. In other embodiments a gas manifold valve cluster and ALD deposition apparatus are provided.
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