Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jul 28, 2009
Grant Date -
Feb 15, 2007
app pub date -
Oct 23, 2006
filing date -
Sep 30, 2002
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
The present invention presents an improved upper electrode for a plasma processing system, wherein the design and fabrication of an electrode plate with a deposition shield coupled to the upper electrode advantageously provides gas injection of a process gas with substantially minimal erosion of the upper electrode while providing protection to a chamber interior.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully