Position measurement system and lithographic apparatus
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United States of America Patent
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Oct 6, 2009
Grant Date -
Mar 8, 2007
app pub date -
Aug 14, 2006
filing date -
Sep 2, 2005
priority date (Note) -
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status (Latency Note)
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Abstract
A position measurement system includes a first position measurement unit configured to measure a position of an object in a first and a second direction, the first position measurement unit including a first sensor and a first grating that extends in a first direction, a second position measurement unit configured to measure the position of the object in the first and the second direction, the second position measurement unit including a second sensor and a second grating that extends in the first direction. The position measurement system is configured to initialize the second position measurement unit based on a position measurement of the first position measurement unit.
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