Method for producing resin for chemically amplified positive resist

United States of America Patent

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Issued Date
Mar 29, 2007
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Sep 28, 2006
filing date
Sep 29, 2005

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Abstract

A method for producing a resin for a chemically amplified positive resist by polymerizing at least one monomer and/or at least one oligomer which is polymerized to provide a resin for a chemically amplified positive resist, in which two or more polymerization initiators are used to initiate the polymerization, thereby the resin is obtained at a high yield.

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Patent Owner(s)

Patent Owner	Address
SUMITOMO CHEMICAL COMPANY LIMITED	2-7-1 NIHONBASHI CHUO-KU TOKYO 1036020
SUMITOMO SEIKA CHEMICALS COMPANY LIMITED	346-1 MIYANISHI HARIMA-CHO KAKO-GUN HYOGO 675-0145

International Classification(s)

G03C:PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES....

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[Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Fuji, Yusuke	Osaka, JP	21	202
Fujishima, Hiroaki	Niihama-shi, JP	14	78
Okamoto, Masafumi	Himeji-shi, JP	19	287
Okazaki, Shinya	Himeji-shi, JP	21	74

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Method for producing resin for chemically amplified positive resist

Number of patents in Portfolio can not be more than 2000

United States of America Patent

11528443

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11528443

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