Lithographic apparatus temperature compensation
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United States of America Patent
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Jul 12, 2011
Grant Date -
Apr 5, 2007
app pub date -
Oct 4, 2005
filing date -
Oct 4, 2005
priority date (Note) -
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Abstract
A lithographic apparatus includes a position measurement system to determine along a measurement path a position of a first part of the lithographic apparatus with respect to a position of a second part of the lithographic apparatus. The position determination system comprises a plurality of temperature sensors to measure a temperature of a medium along the measurement path. The position measurement system corrects the determined position making use of the temperature as measured by the temperature sensors.
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