Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials
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United States of America Patent
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Jun 17, 2008
Grant Date -
Apr 5, 2007
app pub date -
Dec 5, 2006
filing date -
Jun 21, 1993
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A composition for removing resists and etching residue from substrates containing at least one nucleophilic amine compound having oxidation and reduction potentials, at least one organic solvent, water and, optionally, a chelating agent is described. The chelating agent is preferred to be included since it provides added stability and activity to the cleaning composition so that the composition has long term effectiveness. If a chelating agent is not present, the composition, while providing for adequate stripping and cleaning upon initial use of the composition following mixing, has only short term stability. In this latter instance, the nucleophilic amine compound and organic solvent components of the composition preferably are maintained separate from each other until it is desired to use the composition. Thereafter, the components are combined.
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