Method and apparatus for producing spherical silicon single-crystal

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United States of America Patent

APP PUB NO 20070079749A1
SERIAL NO

11543842

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Abstract

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Disclosed is a method for producing a spherical silicon single-crystal, which comprises the steps of heating and melting a silicon material held in a vessel, keeping the molten silicon material at a temperature around its melting point for a given time-period to partly solidify the molten silicon material, and dropping the molten silicon material including a solidified portion, from the vessel into a gas phase. The spherical silicon single-crystal production method of the present invention makes it passable to obtain a spherical silicon single-crystal having a higher degree of crystallinity with enhanced efficiency in a simplified manner.

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Patent Owner(s)

Patent OwnerAddress
JAPAN AEROSPACE EXPLORATION AGENCY44 FANDI CHIDING DONGMACHI SHENDASI TOKYO JAPAN 1 TOKYO TOKYO METROPOLIS

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kuribayashi, Kazuhiko Sagamihara-shi, JP 4 4
Nagashio, Kosuke Sagamihara-shi, JP 1 1
Okamoto, Hideki Sagamihara-shi, JP 35 176

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