Immersion lithography apparatus and methods
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United States of America Patent
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Jul 26, 2011
Grant Date -
Apr 26, 2007
app pub date -
Jun 29, 2006
filing date -
Oct 24, 2005
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A lithography apparatus includes an imaging lens module; a substrate table positioned underlying the imaging lens module and configured to hold a substrate; and a cleaning module adapted to clean the lithography apparatus. The cleaning module is selected from the group consisting of an ultrasonic unit, a scrubber, a fluid jet, an electrostatic cleaner, and combinations thereof.
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