Method for sputtering a multilayer film on a sheet workpiece at a low temperature
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United States of America Patent
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Issued Date -
May 31, 2007
app pub date -
Nov 30, 2005
filing date -
Nov 30, 2005
priority date (Note) -
Abandoned
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Abstract
A method for sputtering a multilayer film on a sheet workpiece at a low temperature of the present invention has the following steps: employing plasma to clean a surface of a sheet workpiece, sputtering at least one metal oxide or semiconductor oxide on the sheet workpiece, and sputtering at least one ITO transparent electric layer on the sheet workpiece. The film sputtering process of the sheet workpiece employs continuously connecting work stations, thereby controlling delay time between the work stations of the sheet workpiece within a given range. The sheet workpiece is made from a macromolecular material.
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