Deposition of LiCoO.sub.2

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United States of America Patent

PATENT NO 7959769
APP PUB NO 20070125638A1
SERIAL NO

11557383

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Abstract

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layer by utilizing a rapid thermal anneal process with short ramp rates.

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Patent Owner(s)

Patent OwnerAddress
SAPURAST RESEARCH LLC1209 ORANGE STREET CORPORATION TRUST CENTER WILMINGTON DE 19801

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Demaray, Richard E Portola Valley, US 36 1822
Neudecker, Bernd J Littleton, US 43 1662
Zhang, Hongmei San Jose, US 48 679

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