Mask blank and photomask having antireflective properties

Number of patents in Portfolio can not be more than 2000

United States of America Patent

APP PUB NO 20070128528A1
SERIAL NO

11526866

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The present invention relates to mask blanks with anti reflective coatings comprising at least two sublayers. Such bilayer or multilayer anti reflective coatings are advantageous for binary and phase shift mask blanks for use in lithography for an exposure wavelength of 300 nm or less with improved anti reflection properties; and to EUVL mask blanks having improved inspection properties.

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Patent Owner(s)

Patent OwnerAddress
THE INVENTION SCIENCE FUND I LLC11235 S E 6TH STREET SUITE 200 BELLEVUE WA 98004

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Becker, Hans Frankfurt, DE 42 648
Buttgereit, Ute Zella-Mehlis, DE 13 228
Goetzberger, Oliver Meiningen, DE 6 180
Hess, Gunter Meiningen, DE 12 129
Renno, Markus Meiningen, DE 10 247
Schmidt, Frank Jena, DE 171 1685
Sobel, Frank La Baule, CA 11 240

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