Lithographic apparatus, device manufacturing method, and device manufactured thereby
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United States of America Patent
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Jul 1, 2008
Grant Date -
Jun 14, 2007
app pub date -
Dec 21, 2006
filing date -
Nov 27, 2002
priority date (Note) -
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Abstract
Apparatus and methods for compensating for the movement of a substrate in a lithographic apparatus during a pulse of radiation include providing an optical structure configured to move a patterned projection beam incident on the substrate in synchronism with the substrate.
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