Lithographic apparatus and device manufacturing method using laser trimming of a multiple mirror contrast device
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United States of America Patent
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Issued Date -
Jun 14, 2007
app pub date -
Dec 14, 2005
filing date -
Dec 14, 2005
priority date (Note) -
Abandoned
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Abstract
A lithographic apparatus comprises a topography measurement device, a patterning device, and a corrective device. The topography measurement device measures a topography of at least one mechanical element of a patterning device. The patterning device comprises an array of individually controllable mechanical elements that are arranged to impart a pattern to a radiation beam. The corrective device corrects a mechanical property of the at least one mechanical element on the basis of information obtained by the topography measurement device.
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