Method of fabrication and device comprising elongated nanosize elements
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United States of America Patent
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Issued Date -
Jul 12, 2007
app pub date -
Sep 10, 2004
filing date -
Sep 12, 2003
priority date (Note) -
Abandoned
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Abstract
A method of fabricating devices comprising elongated nanosize elements as well as such devices are disclosed. The devices comprise epitaxially grown layers into which elongated nanosize elements, such as carbon nanotubes, are incorporated. A substrate supporting epitaxial growth of an epitaxial layer is provided, elongated nanosize elements is provided onto the substrate and epitaxially overgrown with an epitaxial layer. The elongate nanosize elements are thereby at least partly encapsulated by the epitaxially grown layer. One or more components are prepared in the layer, the one or more components being prepared by means of lithography. Devices with carbon nanotubes as the active element may thereby be provided. The method is suitable for hybrid devices, hybrid between conventional semiconductor devices and nano-devices.
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