Gas dispersion shield and method

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United States of America Patent

APP PUB NO 20070163498A1
SERIAL NO

11633696

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A gas dispersion shield and method for protecting the bottom surface of a gas deposition chamber, while injecting gas from a gas insertion channel into the chamber at a non-vertical angle. The gas dispersion shield includes a cylindrically shaped vertical sidewall, an annular flange extending horizontally and outwardly from the sidewall upper end, and a horizontal wall that extends inwardly from the sidewall lower end. The flange includes a top surface, a bottom surface, and a plurality of holes formed through the flange each extending in a non-vertical direction from the bottom surface to the top surface. The bottom surface includes an annular protrusion that fits at least partially into the gas insertion channel, to ensure the gas flows through the non-vertical holes instead of escaping around the flange.

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Patent Owner(s)

Patent OwnerAddress
PENTAGON TECHNOLOGIES GROUP INC21031 ALEXANDER CT HAYWARD CA 94545

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Clark, Randall Colchester, VT 3 2

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