Substrate holding unit, exposure apparatus having same, exposure method, method for producing device, and liquid repellant plate

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United States of America Patent

PATENT NO 8705008
SERIAL NO

11629070

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A substrate holder includes a base; a first holding portion which is formed on the base and which attracts and holds a substrate; and a second holding portion which is formed on the base and which attracts and holds a plate member in the vicinity of the substrate attracted and held by the first holding portion. In an exposure apparatus including such a substrate holder, the plate can be exchanged easily, thereby making the maintenance of the apparatus easy. Consequently, such an exposure apparatus is suitable for immersion exposure.

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Patent Owner(s)

Patent OwnerAddress
NIKON CORPORATION1-5-20 NISHIOI SHINAGAWA-KU TOKYO 1408601 ?1408601

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Shibazaki, Yuichi Kumagaya, JP 294 5251

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