Method and apparatus for improved plasma arc torch cut quality
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United States of America Patent
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Issued Date -
Aug 9, 2007
app pub date -
Jan 29, 2007
filing date -
Jan 27, 2006
priority date (Note) -
Abandoned
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Abstract
Controlling the flow of a secondary gas reduces entrainment of the secondary gas and a plasma gas that forms a plasma arc in a plasma arc torch system. Reducing entrainment of the secondary gas and the plasma gas that forms the plasma arc improves the quality of cuts made with the plasma arc torch.
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