POLISHING COMPOSITION AND RINSE COMPOSITION

United States of America Patent

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app pub date
Apr 25, 2007
filing date
Sep 30, 2002

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Abandoned

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Abstract

A polishing composition for reducing the haze level of the surface of silicon wafers contains hydroxyethyl cellulose, polyethylene oxide, an alkaline compound, water, and silicon dioxide.

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Patent Owner(s)

Patent Owner	Address
FUJIMI INCORPORATED	1-1 CHIRYO 2-CHOME NISHIBIWAJIMA-CHO KIYOSU-SHI AICHI 452-8502

International Classification(s)

C09K:MATERIALS FOR APPLICATIONS NOT OTHERWISE PROVIDED ....

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[Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
IWASA, Shoji	Aichi, JP	5	119

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POLISHING COMPOSITION AND RINSE COMPOSITION

Number of patents in Portfolio can not be more than 2000

United States of America Patent

11740005

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11740005

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