Water Supply Apparatus And Cleaning System For Cleaning The Water Supply Apparatus
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United States of America Patent
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N/A
Issued Date -
Aug 30, 2007
app pub date -
Nov 15, 2004
filing date -
Nov 14, 2003
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
A cleaning system designed for cleaning a water supply apparatus which is provided with: a tap water inlet (2); a mineral dosing ubtil unit (18) with the aid of which, on the basis of tap water, mineral water can be generated; water processing means and a control unit (24) designed for controlling at least a part of the water processing means according to a predetermined water processing program for the purpose of presenting mineral water, the cleaning system being provided with at least one cleaning agent vessel (H) from which, in use, cleaning agent can be supplied, directly or indirectly,to the water supply apparatus, wherein the cleaning system is provided with a cleaning system control unit designed for controlling at least a part of the water processing means according to a predetermined cleaning program for the purpose of a cleaning at least a part of the water processing means.
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Family
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Cited Art Landscape
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