Processing Liquid and Processing Method for Semiconductor Device, and Semiconductor Manufacturing Apparatus
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United States of America Patent
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Issued Date -
Oct 4, 2007
app pub date -
Jul 11, 2005
filing date -
Jul 16, 2004
priority date (Note) -
Abandoned
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Abstract
Disclosed is a process liquid which causes only little dissolution of atoms from a semiconductor surface and enables to form a clean and flat semiconductor surface. Also disclosed are a processing method and an apparatus for manufacturing a semiconductor. Specifically disclosed is a process liquid-which causes only little dissolution of atoms from a semiconductor surface by using an aqueous solution containing at least one alcohol or ketone, thereby realizing a clean and flat surface.
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