Apparatus and method for processing substrates using one or more vacuum transfer chamber units

United States of America Patent

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Dec 8, 2009
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Oct 4, 2007
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Mar 28, 2007
filing date
Mar 28, 2006

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Abstract

An apparatus and method for processing substrates uses one or more vacuum transfer chamber units to transfer some of the substrates between at least one load lock chamber unit and at least one vacuum process chamber unit.

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ARCUS TECHNOLOGY, INC.

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H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....

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Inventor Name	Address	# of filed Patents	Total Citations
Chang, Christopher C	Brentwood , US	27	1334
Pak, Samuel S	San Ramon , US	16	717

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Apparatus and method for processing substrates using one or more vacuum transfer chamber units

Number of patents in Portfolio can not be more than 2000

United States of America Patent

11692850

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PATENT NO	7628574
APP PUB NO	20070231109A1
SERIAL NO	11692850
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity Expired	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
December 08, 2009	US,7628574,B2 US7628574B2	GRANTED PATENT AS SECOND PUBLICATION
October 04, 2007	US,20070231109,A1 US20070231109A1	FIRST PUBLISHED PATENT APPLICATION

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11692850

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